Threshold and criterion for ion track etching in SiO2 layers grown on Si

This publication has 20 references indexed in Scilit:

• Cathodoluminescence and photoluminescence of swift ion irradiation modified zinc oxide-porous silicon nanocomposite
  Materials Science and Engineering: B, 2012
• A new nanoporous material based on amorphous silicon dioxide
  Bulletin of the Russian Academy of Sciences: Physics, 2012
• Ion beam induced dissolution and precipitation of in situ formed Si-nanostructures in a-SiN :H matrix
  Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2012
• A study of the critical factor determining the size of etched latent tracks formed on SiO2 glass by swift-Cl-ion irradiation
  Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2012
• Etched track morphology in SiO₂irradiated with swift heavy ions
  Lithuanian Journal of Physics, 2009
• Nanoporous SiO2/Si thin layers produced by ion track etching: Dependence on the ion energy and criterion for etchability
  Journal of Applied Physics, 2008
• Integrated microfluidic–microoptical systems fabricated by dry etching of soda-lime glass
  Microelectronic Engineering, 2008
• Status of ion track technology—Prospects of single tracks
  Radiation Measurements, 2005
• Anisotropy of Co nanoparticles induced by swift heavy ions
  Physical Review B, 2003
• Transient thermal processes in heavy ion irradiation of crystalline inorganic insulators
  Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2000