Thickness dependence of room temperature permittivity of polycrystalline BaTiO3 thin films by radio-frequency magnetron sputtering
Authors:
- 1 May 1997
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 81 (9) , 6322-6327
Abstract
Polycrystalline thin films with thickness ranging from 2100 to 20 000 Å were prepared on platinum substrates using off-axis radio-frequency magnetron sputtering. The variation in room temperature permittivity of the films was investigated with respect to thickness using x-ray diffraction and transmission electron microscopy. All films were ferroelectric and their room temperature permittivity, which was significantly higher than previously reported values, showed a strong dependence on film thickness. Higher permittivity was attributed primarily to the presence of ferroelectric domains. The room temperature permittivity of the thin films showed large variations with grain size, as in the case of ceramics. The increase in permittivity with increasing film thickness was attributed to the decrease in defect concentration with grain growth. The 20 000 Å film showed an abrupt decrease in permittivity and the presence of an intergranular phase having titanium-excess composition; these phenomena are discussed in terms of domain boundary pinning and recrystallization.
Keywords
This publication has 22 references indexed in Scilit:
- Topics in electronic ceramicsIEEE Transactions on Electrical Insulation, 1990
- Ferroelectric materials for 64 Mb and 256 Mb DRAMsIEEE Circuits and Devices Magazine, 1990
- Dielectric properties of fine-grained barium titanate ceramicsJournal of Applied Physics, 1985
- The effect of temperature on properties of RF Sputtered BaTiO 3 filmsFerroelectrics, 1981
- Radio-frequency-sputtered tetragonal barium titanate films on siliconJournal of Vacuum Science and Technology, 1979
- Grain-size effects on dielectric properties in barium titanate ceramicsJournal of Applied Physics, 1976
- Characteristics of rf Sputtered Barium Titanate Films on SiliconJournal of Vacuum Science and Technology, 1972
- Characteristics of RF sputtered barium titanate thin filmsProceedings of the IEEE, 1971
- Fabrication of rf-Sputtered Barium Titanate Thin FilmsJournal of Vacuum Science and Technology, 1971
- Preparation of Thin BaTiO3 Films by dc Diode SputteringJournal of Applied Physics, 1970