Influence of tantalum dopant ions (Ta5+) on the efficiency of the tungsten trioxide photoelectrode
Authors:
- 4 August 2008
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 205 (8) , 2038-2041
Abstract
The paper presents the influence of the tantalum dopant ions (Ta5+) on the properties of WO3 film, used as photoelectrode for water photolysis. The photoluminescence and photocurrent stability were recorded in a photoelectrochemical system having doped and, respectively, undoped WO3 films, deposited by spray pyrolysis on fluorine–doped tin oxide as photoanode and Pt as cathode, in electrolyte HCl (pH = 5). The crystalline structure, topography and electrical properties were investigated. The experiments confirm that the doping process double the photoelectrode efficiency.Keywords
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