Unravelling the mechanism of phase fraction modulation via process parameter tuning and first-principles study for enhanced TCR in VO x -based uncooled microbolometers
Authors:
- Sooraj KumarSKSooraj Kumar
- Gagan Kumar SharmaGSGagan Kumar Sharma
- Ujjwal ChitnisUCUjjwal Chitnis
- Shalini SinghSSShalini Singh
- Jay Krishna AnandJAJay Krishna Anand
- Poojalakshmi VageeswaranPVPoojalakshmi Vageeswaran
- Santanu DasSantanu Das
- Dibyajyoti GhoshDibyajyoti Ghosh
- Davinder KaurDavinder Kaur
- Ankur GoswamiAnkur Goswami
- 22 January 2026
- journal article
- research article
- Published by Royal Society of Chemistry (RSC) in Journal of Materials Chemistry C
- Vol. 14 (5) , 1778-1788
Abstract
Changing the Ar/O 2 flow ratio at the gas inlet leads to an increase in TCR at low-temperature deposition in a sputtering chamber.Keywords
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