An exchangeable Si wafer internal reflection element for FT-IR measurement of water sample
Authors:
- 15 April 2001
- journal article
- Published by Elsevier in Sensors and Actuators B: Chemical
- Vol. 74 (1-3) , 54-59
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Chiral-discriminative amino acid films prepared by vacuum vaporization and/or plasma processingThe Analyst, 2000
- CMOS-based chemical microsensors: components of a micronose system1999
- Rutherford backscattering spectrometry investigations of chemical sensors for the detection of metals: application to calixarene and functionalized cottonsSensors and Actuators B: Chemical, 1999
- Assembly of Organic Molecules on Silicon Surfaces via the Si−N LinkageJournal of the American Chemical Society, 1998
- Highly Stable Si−C Linked Functionalized Monolayers on the Silicon (100) SurfaceLangmuir, 1998
- Studies on siloxane polymers for NIR-evanescent wave absorbance sensorsSensors and Actuators B: Chemical, 1997
- Alkyl Monolayers on Silicon Prepared from 1-Alkenes and Hydrogen-Terminated SiliconJournal of the American Chemical Society, 1995
- Characterization of a Fiber-Optic Evanescent Wave Absorbance Sensor for Nonpolar Organic CompoundsApplied Spectroscopy, 1993
- On the formation and structure of self-assembling monolayers. I. A comparative atr-wettability study of Langmuir—Blodgett and adsorbed films on flat substrates and glass microbeadsJournal of Colloid and Interface Science, 1984
- The Reflection and Transmission of Infrared Materials: I, Spectra from 2 50 MicronsApplied Optics, 1963