Optimization of Polymer-bound PAG (PBP) for 20nm EUV Lithography
Authors:
- James W. ThackerayJTJames W. Thackeray
- Vipul Jain JainVJVipul Jain Jain
- Suzanne ColeySCSuzanne Coley
- Matthew ChristiansonMCMatthew Christianson
- Daniel ArriolaDADaniel Arriola
- Paul LaBeaumePLPaul LaBeaume
- Su-Jin KangSKSu-Jin Kang
- Mike WagnerMWMike Wagner
- Jin Wuk SungJSJin Wuk Sung
- Jim CameronJCJim Cameron
- 1 January 2011
- journal article
- Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
- Vol. 24 (2) , 179-183
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
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