In situ SEM indentation experiments: Instruments, methodology, and applications
- 12 January 2009
- journal article
- review article
- Published by Wiley in Microscopy Research and Technique
- Vol. 72 (3) , 242-249
Abstract
The purpose of this article is to present the design and capabilities of two in situ scanning electron microscope (SEM) indentation instruments covering a large load range from μN to N. The capabilities and advantages of in situ SEM indentation are illustrated by two applications: indentation of a thin film and a nanowire. All the experiments were performed on electrodeposited cobalt, whose outstanding magnetic properties make it a candidate material for MEMS and NEMS devices. Microsc. Res. Tech., 2009.Keywords
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