Epoxy bond and stop-etch (EBASE) technique enabling backside processing of (Al)GaAs heterostructures

Authors:
  • NHN.E. Harff
    N.E. Harff
  • MSM.E. Sherwin
    M.E. Sherwin
  • HCH.C. Chui
    H.C. Chui

Abstract
No abstract available