Relation Between Enhancement in Growth and Thickness-Dependent Crystallization in ALD TiO[sub 2] Thin Films
- 1 January 2011
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 158 (1) , D6
Abstract
No abstract availableThis publication has 22 references indexed in Scilit:
- Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water processJournal of Applied Physics, 2005
- Growth Characteristics of Atomic Layer Deposited TiO[sub 2] Thin Films on Ru and Si Electrodes for Memory Capacitor ApplicationsJournal of the Electrochemical Society, 2005
- Structurally and Electrically Uniform Deposition of High-k TiO[sub 2] Thin Films on a Ru Electrode in Three-Dimensional Contact Holes Using Atomic Layer DepositionElectrochemical and Solid-State Letters, 2005
- Atomic Layer Deposition Chemistry: Recent Developments and Future ChallengesAngewandte Chemie International Edition, 2003
- Transmission electron microscopy studies of atomic layer deposition TiO2 films grown on siliconThin Solid Films, 2003
- Influence of structure development on atomic layer deposition of TiO2 thin filmsApplied Surface Science, 2001
- Anomalous effect of temperature on atomic layer deposition of titanium dioxideJournal of Crystal Growth, 2000
- Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth processApplied Surface Science, 2000
- Titanium isopropoxide as a precursor in atomic layer epitaxy of titanium dioxide thin filmsChemistry of Materials, 1993
- Atomic layer epitaxyMaterials Science Reports, 1989