Influence of temperature on the properties of SiC xN y:H films prepared by plasma-enhanced chemical vapour deposition
Authors:
- Wei ZhangWZWei Zhang
- Keyun ZhangKZKeyun Zhang
- Baiqing WangBWBaiqing Wang
- 30 September 1994
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 26 (2-3) , 133-140
Abstract
No abstract availableThis publication has 9 references indexed in Scilit:
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