Influence of deposition condition on electrical properties of a-IGZO films deposited by plasma-enhanced reactive sputtering
Authors:
- Kosuke TakenakaKTKosuke Takenaka
- Masashi EndoMEMasashi Endo
- Giichiro UchidaGUGiichiro Uchida
- Akinori EbeAEAkinori Ebe
- Yuichi SetsuharaYSYuichi Setsuhara
- 1 January 2019
- journal article
- research article
- Published by Elsevier in Journal of Alloys and Compounds
- Vol. 772, 642-649
Abstract
No abstract availableKeywords
Funding Information
- Grant-in-Aid for Scientific Research (B) (16H04509)
- Japan Society for the Promotion of Science
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