Crystallization behavior of N -doped Ge-rich GST thin films and nanostructures: An in-situ synchrotron X-ray diffraction study
Authors:
- O. ThomasOTO. Thomas
- C. MocutaCMC. Mocuta
- M. PuteroMPM. Putero
- M.-I. RichardMRM.-I. Richard
- P. BoivinPBP. Boivin
- F. ArnaudFAF. Arnaud
- 1 May 2021
- journal article
- research article
- Published by Elsevier in Microelectronic Engineering
- Vol. 244-246
Abstract
No abstract availableKeywords
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