Atomic Simulation of Wear and Slip Behavior Between Monocrystalline Silicon and 6H-SiC Friction Pair

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Abstract
The slip mechanism between the chunk and wafer during high-speed dynamic scanning of the extreme ultraviolet lithography (EUV) motion stage remains unclear. Considering real-machined roughness, molecular dynamics (MD) simulations were performed to investigate the nanotribological behavior of 6H-SiC sliders on single-crystal silicon substrates. The effects of sinusoidal asperity parameters and normal loads on wear and slip were systematically analyzed. Results indicate that, for friction between sinusoidal asperities and ideal flat surfaces, the amplitude of surface parameters exhibits negligible influence on friction. In contrast, reduced normal loads and lower periods significantly increase both friction force and coefficient of friction (COF).
Funding Information
  • National Natural Science Foundation of China (5175499)

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