This study reports the results of an investigation of a niobium-doped titania dioxide thin film fabricated via a sol-gel method and dip-coating. Niobium-doped and undoped titania films were deposited on silicon wafers and soda-lime glass slides. The niobium-doped and undoped titanium dioxide films exhibit a high refractive index of ∼ 2.1 and thicknesses exceeding 110 nm. The study addresses the technological procedures, characterisation methods, and the influence of niobium doping on the optical properties of TiO₂ films.