Optically variable imaging using nanoimprint technique
Authors:
- V. GrigaliūnasVGV. Grigaliūnas
- D. JuciusDJD. Jucius
- S. TamulevičiusS. Tamulevičius
- A. GuobienėAGA. Guobienė
- V. KopustinskasVKV. Kopustinskas
- 1 May 2005
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 245 (1-4) , 234-239
Abstract
No abstract availableThis publication has 12 references indexed in Scilit:
- Microrelief structures for anti-counterfeiting applicationsMicroelectronic Engineering, 2003
- Imprint lithography of pyramidal photonic pillars using hydrazine etchingPhysica E: Low-dimensional Systems and Nanostructures, 2003
- Nanoimprint lithography: an alternative nanofabrication approachMaterials Science and Engineering: C, 2003
- Replication technology for photonic band gap applicationsOptical Materials, 2001
- Pattern formation in hot embossing of thin polymer filmsNanotechnology, 2001
- Micro-technology for anti- counterfeitingMicroelectronic Engineering, 2000
- Problems of the nanoimprinting technique for nanometer scale pattern definitionJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1998
- Design and fabrication of diffractive optical elementsMicroelectronic Engineering, 1997
- Imprint lithography with sub-10 nm feature size and high throughputMicroelectronic Engineering, 1997
- Imprint of sub-25 nm vias and trenches in polymersApplied Physics Letters, 1995