Polarization control in flexible interference lithography for nano-patterning of different photonic structures with optimized contrast

Authors:
Open Access
Publisher website
Google Scholar
Abstract
Half-wave plates were introduced into an interference-lithography scheme consisting of three fibers that were arranged into a rectangular triangle. Such a flexible and compact geometry allows convenient tuning of the polarizations of both the UV laser source and each branch arm. This not only enables optimization of the contrast of the produced photonic structures with expected square lattices, but also multiplies the nano-patterning functions of a fixed design of fiber-based interference lithography. The patterns of the photonic structures can be thus tuned simply by rotating a half-wave plate.
Funding Information
  • 973 Program (2013CB922404)
  • National Natural Science Foundation of China (11274031)

This publication has 17 references indexed in Scilit: