Effect of oxygen vacancies on the ferroelectric Hf0.5Zr0.5O2 stabilization: DFT simulation

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1 August 2019

journal article
research article
Published by Elsevier in Microelectronic Engineering

Vol. 216
DOI:10.1016/j.mee.2019.111041

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Funding Information

ISP SB RAS state research program (0306-2019-0005)

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