Polymer ablation: From fundamentals of polymer design to laser plasma thruster
Authors:
- L. UrechLUL. Urech
- T. LippertTLT. Lippert
- C.R. PhippsCPC.R. Phipps
- A. WokaunAWA. Wokaun
- 1 May 2007
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 253 (15) , 6409-6415
Abstract
No abstract availableKeywords
This publication has 38 references indexed in Scilit:
- Models for Laser Ablation of PolymersChemical Reviews, 2003
- Structure property relations of photoreactive polymers designed for laser ablationJournal of Photochemistry and Photobiology A: Chemistry, 2001
- Analysis of neutral fragments from ultraviolet laser irradiation of a photolabile triazeno polymerJournal of Applied Physics, 1999
- Laser-Induced Decomposition and Ablation Dynamics Studied by Nanosecond Interferometry. 2. A Reactive Nitrocellulose FilmThe Journal of Physical Chemistry B, 1998
- Photothermal Transient Expansion and Contraction Dynamics of Polymer Films by Nanosecond InterferometryThe Journal of Physical Chemistry, 1996
- Synthesis and characterization of novel triazeno‐group containing photopolymersMacromolecular Chemistry and Physics, 1995
- Photolysis, thermolysis, and protolytic decomposition of a triazene polymer in solutionMacromolecular Chemistry and Physics, 1995
- Ablative photodecomposition of polymer films by pulsed far‐ultraviolet (193 nm) laser radiation: Dependence of etch depth on experimental conditionsJournal of Polymer Science: Polymer Chemistry Edition, 1984
- Direct etching of polymeric materials using a XeCl laserApplied Physics Letters, 1983
- Effective deep ultraviolet photoetching of polymethyl methacrylate by an excimer laserApplied Physics Letters, 1982