High volume nanoimprint lithography on III/V substrates: Imprint fidelity and stamp lifetime
Authors:
- Torbjörn ErikssonTETorbjörn Eriksson
- Shoko YamadaSYShoko Yamada
- Prasanna Venkatesh KrishnanPKPrasanna Venkatesh Krishnan
- Sankar RamasamySRSankar Ramasamy
- Babak HeidariBHBabak Heidari
- 31 March 2011
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 88 (3) , 293-299
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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