Deposition of alumina thin film by dual magnetron sputtering: Is it γ-Al2O3?
Authors:
- W. EngelhartWEW. Engelhart
- W. DreherWDW. Dreher
- V. SchierVSV. Schier
- 1 December 2011
- journal article
- Published by Elsevier in Acta Materialia
- Vol. 59 (20) , 7757-7767
Abstract
No abstract availableKeywords
This publication has 30 references indexed in Scilit:
- Thermal Investigation of Al2O3 Thin Films for Application in Cutting OperationsAdvanced Engineering Materials, 2009
- Ab initiostudy of the physical properties of: Lattice dynamics, bulk properties, electronic structure, bonding, optical properties, and ELNES/XANES spectraPhysical Review B, 2008
- Dual Nanoparticle/Substrate Control of Catalytic DehydrogenationAdvanced Materials, 2007
- R factors in Rietveld analysis: How good is good enough?Powder Diffraction, 2006
- Theoretical structure determination ofPhysical Review B, 2001
- Optical Properties of Aluminum Oxide: Determined from Vacuum Ultraviolet and Electron Energy‐Loss SpectroscopiesJournal of the American Ceramic Society, 1998
- Slip and twinning dislocations in sapphire (α-Al2O3)Philosophical Magazine A, 1998
- Improvement of high-temperature creep resistance in fine-grained Al2O3 by Zr4+ segregation in grain boundariesPhilosophical Magazine Letters, 1997
- Thermal conductivity of thin amorphous alumina filmsThin Solid Films, 1993
- A study of the vacancy distribution in non-stoichiometric spinels by magic-angle spinning NMRPhilosophical Magazine A, 1986