Ohmic contact formation mechanisms of TiN film on 4H–SiC
Authors:
- Zhongtao WangZWZhongtao Wang
- Xijun WangXWXijun Wang
- Wei LiuWLWei Liu
- Xiaoliang JiXJXiaoliang Ji
- Chunqing WangCWChunqing Wang
- 1 April 2020
- journal article
- research article
- Published by Elsevier in Ceramics International
- Vol. 46 (6) , 7142-7148
Abstract
No abstract availableKeywords
Funding Information
- National Natural Science Foundation of China (U1537207, 51374084)
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