Remote Hydrogen Microwave Plasma Chemical Vapor Deposition of Amorphous Silicon Carbonitride (a‐SiCN) Coatings Derived From Tris(dimethylamino)Silane

This publication has 51 references indexed in Scilit:

• Hard and High-Temperature-Resistant Silicon Carbonitride Coatings Based on N-Silyl-Substituted Cyclodisilazane Rings
  Journal of the Electrochemical Society, 2008
• Evaluation of corrosion resistance of SiCN films deposited by HWCVD using organic liquid materials
  Thin Solid Films, 2008
• Investigations on hardness of rf sputter deposited SiCN thin films
  Materials Science and Engineering: A, 2004
• A comparative study of plasma enhanced chemically vapor deposited SiOH and SiNCH films using the environmentally benign precursor diethylsilane
  Materials Letters, 2002
• Influence of silane partial pressure on the properties of amorphous SiCN films prepared by ECR-CVD
  Thin Solid Films, 2000
• Thermogravimetric analysis/mass spectrometry investigation of the thermal conversion of organosilicon precursors into ceramics under argon and ammonia. 2. Poly(silazanes)
  Chemistry of Materials, 1992
• Effect of UV irradiation of the film during plasma chemical vapour deposition
  Thin Solid Films, 1992
• An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments
  Journal of Materials Research, 1992
• Silicon carbonitride from polymeric precursors: thermal cross-linking and pyrolysis of oligosilazane model compounds
  Chemistry of Materials, 1992
• Preceramic polymer pyrolysis
  Journal of Materials Science, 1989