A time-of-flight secondary ion microscope
Authors:
- B. SchuelerBSB. Schueler
- P. SanderPSP. Sander
- D.A. ReedDRD.A. Reed
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Effect of SiO2 surface chemistry on the oxidation of siliconApplied Physics Letters, 1989
- Detection of metallic trace impurities on Si(100) surfaces with total reflection X-ray fluorescence (TXRF)Analytical and Bioanalytical Chemistry, 1989
- Surface analysis for Si-wafers using total reflection X-ray fluorescence analysisAnalytical and Bioanalytical Chemistry, 1989
- B-contamination of Si-surfacesAnalytical and Bioanalytical Chemistry, 1989