Characterization of the Si/SiO2 interface morphology from quantum oscillations in Fowler–Nordheim tunneling currents
Authors:
- 1 January 1994
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
- Vol. 12 (1) , 88-95