Effects of slurry pH on chemical and mechanical actions during chemical mechanical polishing of YAG
Authors:
- Qing MuQMQing Mu
- Zhuji JinZJZhuji Jin
- Xiaolong HanXHXiaolong Han
- Ying YanYYYing Yan
- Zili ZhangZili Zhang
- Ping ZhouPZPing Zhou
- 1 October 2021
- journal article
- research article
- Published by Elsevier in Applied Surface Science
- Vol. 563
Abstract
No abstract availableKeywords
Funding Information
- National Natural Science Foundation of China (51621064, 51775084, 51875078, 51991373)
- Science Fund for Creative Research Groups
- National Key Research and Development Program of China (2016YFB1102205)
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