Characterisation parameters for unbalanced magnetron sputtering systems
Authors:
- I.V. SvadkovskiISI.V. Svadkovski
- D.A. GolosovDGD.A. Golosov
- S.M. ZavatskiySZS.M. Zavatskiy
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Magnetron sputtering: a review of recent developments and applicationsVacuum, 2000
- Computational Studies of Plasma Generation and Control in a Magnetron Sputtering SystemJapanese Journal of Applied Physics, 1999
- The influence of magnetron configuration on ion current density and deposition rate in a dual unbalanced magnetron sputtering systemSurface and Coatings Technology, 1998
- Low-pressure magnetron sputteringVacuum, 1998
- Characterization studies of the structure of Al, Zr, and W coatings deposited by closed-field unbalanced magnetron sputteringSurface and Coatings Technology, 1997
- Low pressure magnetron sputtering and selfsputtering dischargesVacuum, 1996
- Influence of an external axial magnetic field on the plasma characteristics and deposition conditions during direct current planar magnetron sputteringJournal of Vacuum Science & Technology A, 1994
- Unbalanced dc magnetrons as sources of high ion fluxesJournal of Vacuum Science & Technology A, 1986
- Unbalanced magnetron ion-assisted deposition and property modification of thin filmsJournal of Vacuum Science & Technology A, 1986
- Charged particle fluxes from planar magnetron sputtering sourcesJournal of Vacuum Science & Technology A, 1986