Paper VII (viii) Tribochemical Reaction of Oxygen and Water on Silicon Surfaces
Authors:
- K. MizuharaKMK. Mizuhara
- S.M. HsuSHS.M. Hsu
- 1 January 1992
- book chapter
- Published by Elsevier
- p. 323-328
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- Sliding damage on hot-pressed and sintered silicon nitride caused by a diamond tip under controlled humidityWear, 1988
- Tribological examination of unlubricated and graphite-lubricated silicon nitride under traction stressWear, 1988
- Friction and Wear of Silicon Nitride Lubricated by Humid Air, Water, Hexadecane and Hexadecane + 0.5 Percent Stearic AcidTribology Transactions, 1988
- Friction and Wear of Silicon Nitride and Silicon Carbide in Water: Hydrodynamic Lubrication at Low Sliding Speed Obtained by Tribochemical WearA S L E Transactions, 1987
- Wear properties of silicon nitride in rolling contactWear, 1986
- Interaction of tribochemistry and microfracture in the friction and wear of silicon nitrideWear, 1985
- The wear rate of n-type Si(100)Wear, 1985
- Material removal mechanism of silicon nitride during rubbing in waterWear, 1984
- Hydrides and Hydroxyls in Thin Silicon Dioxide FilmsJournal of the Electrochemical Society, 1971
- Tracer Evaluation of Hydrogen in Steam-Grown SiO[sub 2] FilmsJournal of the Electrochemical Society, 1967