Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge
Authors:
- Jan SchäferJSJan Schäfer
- Stefan HornSHStefan Horn
- Rüdiger FoestRFRüdiger Foest
- Ronny BrandenburgRBRonny Brandenburg
- Petr VašinaPVPetr Vašina
- Klaus-Dieter WeltmannKWKlaus-Dieter Weltmann
- 1 July 2011
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 205, S330-S334
Abstract
No abstract availableKeywords
Funding Information
- German Ministry for Science and Education (FKZ03FO1072)
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