Diagnostic by emission spectroscopy of an argon–hydrogen RF inductive thermal plasma for purification of metallurgical grade silicon
Authors:
- M BenmansourMBM Benmansour
- M NikravechMNM Nikravech
- D MorvanDMD Morvan
- J AmourouxJAJ Amouroux
- J ChapelleJCJ Chapelle
- 9 October 2004
- journal article
- Published by IOP Publishing in Journal of Physics D: Applied Physics
- Vol. 37 (21) , 2966-2974
Abstract
No abstract availableKeywords
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