Low temperature oxidation behavior of reactively sputtered TiN by x‐ray photoelectron spectroscopy and contact resistance measurements

Authors:
  • CEC. Ernsberger
    C. Ernsberger
  • JNJ. Nickerson
    J. Nickerson
  • TST. Smith
    T. Smith
  • AMA. E. Miller
    A. E. Miller
  • DBD. Banks
    D. Banks
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