Sub‐50 nm Surface Nanopatterning via Nano‐Seed‐Assisted Stereolithography

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Abstract
Three‐dimensional (3D) printing based on stereolithography (SLA) enables microstructured objects, but sub‐100 nm surface resolution remains difficult because of photopolymerization and resin diffusion. Here, we present a nano‐seed‐assisted SLA method for integrating sub‐50 nm surface nanopatterns with 3D‐printed structures. Si master molds with diverse nanoscale geometries are replicated into polymethyl methacrylate (PMMA) nano‐seed templates, enabling controlled resin infiltration and high‐fidelity pattern transfer from 250 nm to micrometer scales, including dots, holes, waves, and crosses. A conformal ultrathin inorganic barrier layer, such as platinum (Pt) or Ga 2 O 3 , suppresses resin‐polymer intermixing, confines curing at the interface, and preserves pattern integrity. The method yields uniform sub‐50 nm nanopatterns over chip‐scale and larger areas up to 45 × 75 mm, verified by high‐resolution TEM and elemental mapping. It integrates decorative or functional nanopatterns with complex 3D objects, exemplified by a 3D‐printed Buddha sculpture. In addition to the hybrid assembly of separately prepared nanopatterned inserts, we further demonstrate the direct fabrication of a monolithic Buddha structure containing a localized nano‐seed‐derived patterned region, confirming that nanoscale surface ornamentation can be incorporated during the SLA printing process without requiring post‐print assembly. Overall, nano‐seed‐assisted SLA offers a scalable route to high‐resolution nanostructuring in 3D‐printed materials.
Funding Information
  • National Research Foundation of Korea (RS‐2025‐02316993)
  • National Research Foundation of Korea (RS‐2024‐00433654)
  • National Research Foundation of Korea (RS‐2023‐00242507)

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