Effect of assistant RF plasma on structure and properties of SiCN thin films prepared by RF magnetron sputtering of SiC target

This publication has 10 references indexed in Scilit:

• Deposition of silicon carbon nitride thin films by microwave ECR plasma enhanced unbalance magnetron sputtering
  Surface and Coatings Technology, 2007
• The affinity of Si–N and Si–C bonding in amorphous silicon carbon nitride (a-SiCN) thin film
  Diamond and Related Materials, 2005
• Gas evolution studies for structural characterization of hydrogenated carbon nitride samples
  Diamond and Related Materials, 2003
• XPS studies of amorphous SiCN thin films prepared by nitrogen ion-assisted pulsed-laser deposition of SiC target
  Diamond and Related Materials, 2001
• Influence of silane partial pressure on the properties of amorphous SiCN films prepared by ECR-CVD
  Thin Solid Films, 2000
• Nitrogen 1s electron binding energy assignment in carbon nitride thin films with different structures
  Journal of Electron Spectroscopy and Related Phenomena, 1997
• Shock-wave-induced phase transition in C:N films
  Diamond and Related Materials, 1997
• Reactive magnetron sputter deposited CNx: Effects of N2 pressure and growth temperature on film composition, bonding, and microstructure
  Journal of Vacuum Science & Technology A, 1996
• Structural properties and electronic structure of low-compressibility materials: β-${\mathrm{Si}}_3$${\mathrm{N}}_4$ and hypothetical β-${\mathrm{C}}_3$${\mathrm{N}}_4$
  Physical Review B, 1990
• Prediction of New Low Compressibility Solids
  Science, 1989