Silicide formation for Co/Ti/Si structures processed by RTP under vacuum
Authors:
- M. SettonMSM. Setton
- J. Van Der SpiegelJSJ. Van Der Spiegel
- 1 September 1989
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 38 (1-4) , 62-71
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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