Physical and structural properties of ZnO sputtered films
Authors:
- Sheng-Yuan ChuSCSheng-Yuan Chu
- 1 July 2002
- journal article
- research article
- Published by Elsevier in Materials Letters
- Vol. 55 (1-2) , 67-72
Abstract
No abstract availableKeywords
This publication has 19 references indexed in Scilit:
- ZnO Film Growth on (0112)LiTaO3 by Electron Cyclotron Resonance-Assisted Molecular Beam Epitaxy and Determination of Its PolarityJapanese Journal of Applied Physics, 2000
- Growth, structure and optical characterization of high quality ZnO thin films obtained by spray pyrolysisThin Solid Films, 1999
- Growth of ZnO thin films on interdigital transducer/Corning 7059 glass substrates by two-step fabrication methods for surface acoustic wave applicationsJournal of Physics D: Applied Physics, 1998
- Characterization and optimization of zinc oxide films by r.f. magnetron sputteringThin Solid Films, 1997
- Sol-gel synthesis of ZnO thin filmsThin Solid Films, 1996
- Influence of Substrate Temperature on Physical Structure of AlN Thin Films Prepared on Polycrystalline MoSi 2 by rf Magnetron SputteringJournal of the American Ceramic Society, 1995
- Transparent and Conductive ZnO Thin Films Prepared by Atmospheric-Pressure Chemical Vapor Deposition Using Zinc AcetylacetonateJapanese Journal of Applied Physics, 1994
- 1.5 GHz Low-Loss Surface Acoustic Wave Filter Using ZnO/Sapphire SubstrateJapanese Journal of Applied Physics, 1993
- Preparation of orientated aluminium nitride films by radio-frequency reactive sputteringJournal of Materials Science Letters, 1990
- Stress-related effects in thin filmsThin Solid Films, 1989