The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films
Authors:
- Mengying WangMWMengying Wang
- Yohann ThimontYTYohann Thimont
- Lionel PresmanesLPLionel Presmanes
- Xungang DiaoXDXungang Diao
- Antoine BarnabéABAntoine Barnabé
- 1 October 2017
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 419, 795-801
Abstract
No abstract availableFunding Information
- National Program on Key Research Project (2016YFB0303901)
- Beijing Natural Science Foundation (2161001)
- Fédération de Recherche FERMAT (Fluides, Energie, Réacteurs, Matériaux et Transferts)
This publication has 42 references indexed in Scilit:
- Resolving surface chemical states in XPS analysis of first row transition metals, oxides and hydroxides: Cr, Mn, Fe, Co and NiApplied Surface Science, 2011
- Microstructure and electrical conductivity of nanocrystalline nickel- and nickel oxide/gadolinia-doped ceria thin filmsActa Materialia, 2008
- Electrochromic degradation in nickel oxide thin film: A self-discharge and dissolution phenomenonElectrochimica Acta, 2005
- Effects of Substrate Temperature and Oxygen Pressure on Crystallographic Orientations of Sputtered Nickel Oxide FilmsMATERIALS TRANSACTIONS, 2005
- Reproducible resistance switching in polycrystalline NiO filmsApplied Physics Letters, 2004
- High-current-density ITOx/NiOx thin-film diodesApplied Physics Letters, 1998
- Porous Nickel Oxide/Nickel Films for Electrochemical CapacitorsJournal of the Electrochemical Society, 1996
- The electrochromic properties of nickel oxide thin films prepared by chemical vapor depositionSolar Energy Materials and Solar Cells, 1993
- The optical gap of NiOZeitschrift für Physik B Condensed Matter, 1992
- Infrared Absorption and Raman Scattering by Two-Magnon Processes in NiOPhysical Review B, 1971