Hard plasmachemical a-SiCN coatings
- 1 July 2016
- journal article
- Published by Allerton Press in Journal of Superhard Materials
- Vol. 38 (4) , 263-270
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
- Characterization of SiCN thin films: Experimental and theoretical investigationsThin Solid Films, 2014
- Mid-frequency PECVD of a-SiCN:H films and their structural, mechanical and electrical propertiesVacuum, 2013
- Microstructure, mechanical properties and wetting behavior of F: Si–C–N films as bio-mechanical coating grown by DC unbalanced magnetron sputteringJournal of Alloys and Compounds, 2013
- Hydrogenated amorphous silicon carbon nitride films prepared by PECVD technology: propertiesJournal of Electrical Engineering, 2012
- The structure, surface topography and mechanical properties of Si–C–N films fabricated by RF and DC magnetron sputteringApplied Surface Science, 2011
- CONTINUOUS STIFFNESS MEASUREMENT DURING INSTRUMENTED INDENTATION TESTINGExperimental Techniques, 2010
- Structural and mechanical properties of amorphous silicon carbonitride films prepared by vapor-transport chemical vapor depositionSurface and Coatings Technology, 2009
- Influence of nitrogen–argon gas mixtures on reactive magnetron sputtering of hard Si–C–N filmsSurface and Coatings Technology, 2002
- Bonding characterization and nano-indentation study of the amorphous SiC N films with and without hydrogen incorporationDiamond and Related Materials, 2001
- Structural characterization of amorphous SiCxNy chemical vapor deposited coatingsJournal of Applied Physics, 1997