Structure and mechanical properties of Mo–N/Cu films produced by inductively coupled plasma reactive sputtering
Authors:
- J.N. KimJKJ.N. Kim
- Somi ParkSPSomi Park
- Taeyoon KimTKTaeyoon Kim
- J.J. LeeJLJ.J. Lee
- 1 August 2011
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 519 (20) , 6876-6880
Abstract
No abstract availableKeywords
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