Characteristics of amorphous VO2 thin films prepared by pulsed laser deposition
- 1 April 2004
- journal article
- Published by Springer Nature in Journal of Materials Science
- Vol. 39 (8) , 2869-2871
Abstract
No abstract availableThis publication has 25 references indexed in Scilit:
- Pulsed laser deposited vanadium oxide thin films for uncooled infrared detectorsSensors and Actuators A: Physical, 2003
- Room temperature deposited vanadium oxide thin films for uncooled infrared detectorsMaterials Research Bulletin, 2003
- Valence reduction process from sol–gel V2O5 to VO2 thin filmsApplied Surface Science, 2002
- Thermochromic VO2 sputtered by control of a vanadium-oxygen emission ratioThin Solid Films, 2001
- Microstructure and metal-insulating transition of vo2 thin filmsMaterials Research Bulletin, 1999
- Epitaxial relationships and electrical properties of vanadium oxide films on r-cut sapphireThin Solid Films, 1999
- Structure characterization of vanadium oxide thin films prepared by magnetron sputtering methodsApplied Surface Science, 1998
- High quality vanadium dioxide films prepared by an inorganic sol-gel methodMaterials Research Bulletin, 1996
- Synthesis of vanadium dioxide thin films from vanadium alkoxidesMaterials Research Bulletin, 1994
- Vanadium dioxide thin films prepared by chemical vapour deposition from vanadium(III) acetylacetonateJournal of Materials Science, 1993