The use of automatic demolding in nanoimprint lithography processes
Authors:
- S. MerinoSMS. Merino
- H. SchiftHSH. Schift
- A. RetolazaARA. Retolaza
- T. HaatainenTHT. Haatainen
- 1 May 2007
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 84 (5-8) , 958-962
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Study of the demolding process—implications for thermal stress, adhesion and friction controlJournal of Micromechanics and Microengineering, 2006
- Multi-layered resist process in nanoimprint lithography for high aspect ratio patternMicroelectronic Engineering, 2006
- Simulation and experimental study of polymer deformation in nanoimprint lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2004
- Review on micro molding of thermoplastic polymersJournal of Micromechanics and Microengineering, 2003