Comparison of cutting performance of ion-plated NbN, ZrN, TiN and (Ti, Al)N coatings
Authors:
- R. LappalainenRLR. Lappalainen
- 1 December 1987
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 33, 117-132
Abstract
No abstract availableKeywords
Funding Information
- Research Council of Finland
- Tekes
This publication has 12 references indexed in Scilit:
- The microstructure of sputter‐deposited coatingsJournal of Vacuum Science & Technology A, 1986
- Titanium aluminum nitride films: A new alternative to TiN coatingsJournal of Vacuum Science & Technology A, 1986
- Morphology and properties of sputtered (Ti,Al)N layers on high speed steel substrates as a function of deposition temperature and sputtering atmosphereJournal of Vacuum Science & Technology A, 1986
- Turning performance of reactively ion plated Ti–N coatingsJournal of Vacuum Science & Technology A, 1986
- Ti–N phases formed by reactive ion platingJournal of Vacuum Science & Technology A, 1985
- Adhesion of titanium nitride coatings on high-speed steelsJournal of Vacuum Science & Technology A, 1985
- Influence of substrate bias on the composition, structure and electrical properties of reactively d.c.-sputtered TiN filmsThin Solid Films, 1982
- The effects of substrate bias on the structural and electrical properties of TiN films prepared by reactive r.f. sputteringThin Solid Films, 1980
- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977
- Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatingsJournal of Vacuum Science and Technology, 1974