Galvanostatic and potentiostatic deposition of bismuth telluride films from nitric acid solution: effect of chemical and electrochemical parameters
Authors:
- S. MichelSMS. Michel
- S. DilibertoSDS. Diliberto
- C. BoulangerCBC. Boulanger
- N. SteinNSN. Stein
- J.M. LecuireJLJ.M. Lecuire
- 1 April 2005
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 277 (1-4) , 274-283
Abstract
No abstract availableKeywords
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