Modeling of H2 and H2/CH4 Moderate-Pressure Microwave Plasma Used for Diamond Deposition

This publication has 36 references indexed in Scilit:

• Non-Maxwellian effect on species and energy transport in moderate pressure H2 plasmas
  Surface and Coatings Technology, 1997
• On the plasma chemistry of the C/H system relevant to diamond deposition processes
  Plasma Chemistry and Plasma Processing, 1996
• Electron energy distribution functions and rate and transport coefficients of H2/H/CH4 reactive plasmas for diamond film deposition
  Plasma Chemistry and Plasma Processing, 1996
• Control of an MPACVD reactor for polycrystalline textured diamond films synthesis: role of microwave power density
  Diamond and Related Materials, 1996
• Spectroscopic analysis and chemical kinetics modeling of a diamond deposition plasma reactor
  Diamond and Related Materials, 1994
• Fluid boundary layer effects in atmospheric-pressure plasma diamond film deposition
  Plasma Chemistry and Plasma Processing, 1993
• Diamond deposition in a bell-jar reactor: influence of the plasma and substrate parameters on the microstructure and growth rate
  Diamond and Related Materials, 1993
• Diamond Films: Procedures and Parameters
  1993
• Progress in the non-equilibrium vibrational kinetics of hydrogen in magnetic multicusp H− ion sources
  Chemical Physics, 1987
• Elementary Processes in Hydrogen-Helium Plasmas
  1987