A Titanium‐Doped SiOx Passivation Layer for Greatly Enhanced Performance of a Hematite‐Based Photoelectrochemical System
Authors:
- 30 June 2016
- journal article
- research article
- Published by Wiley in Angewandte Chemie International Edition
- Vol. 55 (34) , 9922-9926
Abstract
This study introduces an in situ fabrication of nanoporous hematite with a Ti‐doped SiOx passivation layer for a high‐performance water‐splitting system. The nanoporous hematite with a Ti‐doped SiOx layer (Ti‐(SiOx/np‐Fe2O3)) has a photocurrent density of 2.44 mA cm−2 at 1.23 VRHE and 3.70 mA cm−2 at 1.50 VRHE. When a cobalt phosphate co‐catalyst was applied to Ti‐(SiOx/np‐Fe2O3), the photocurrent density reached 3.19 mA cm−2 at 1.23 VRHE with stability, which shows great potential of the use of the Ti‐doped SiOx layer with a synergistic effect of decreased charge recombination, the increased number of active sites, and the reduced hole‐diffusion pathway from the hematite to the electrolyte.Keywords
Funding Information
- NRF (NRF-2015-R1A2A2A01005250)
- IBS-R019-D1
- MOTIE/KEIT (10062092)
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