Investigation of substoichiometric titanium nitride grown by unbalanced magnetron sputtering
Authors:
- S YangSYS Yang
- D.B LewisDLD.B Lewis
- I WadsworthIWI Wadsworth
- J CawleyJCJ Cawley
- J.S BrooksJBJ.S Brooks
- W.D MünzWMW.D Münz
- 1 September 2000
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 131 (1-3) , 228-233
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
- Deposition and properties of thick corrosion and wear-resistant Ti2N coatingsSurface and Coatings Technology, 1995
- A corrosion study of TiN (physical vapour deposition) hard coatings deposited on various substratesSurface and Coatings Technology, 1994
- A new method for hard coatings: ABS TM (arc bond sputtering)Surface and Coatings Technology, 1992
- Corrosion performance of some titanium-based hard coatingsSurface and Coatings Technology, 1991
- Microstructures of TiN films grown by various physical vapour deposition techniquesSurface and Coatings Technology, 1991
- TiN films created in close vicinity of transition from α-Ti(N) to δ-TiNx phaseMaterials Science and Engineering: A, 1991
- Phase formation and characterization of hard coatings in the TiAlN system prepared by the cathodic arc ion plating methodThin Solid Films, 1991
- Evaluation of coating wear resistance for bulk metal formingThin Solid Films, 1980
- Deposition of Ti-N compounds by thermionically assisted triode reactive ion platingThin Solid Films, 1980
- Microstructures of TiN and Ti2N deposits prepared by activated reactive evaporationThin Solid Films, 1979