Influence of oxygen pressure on the structure of reactively deposited indium oxide films

Authors:
  • SMShigetoshi Muranaka
    Shigetoshi Muranaka
  • HHHayato Hirooka
    Hayato Hirooka
  • YBYoshichika Bando
    Yoshichika Bando
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Abstract
Indium oxide films have been reactively deposited at oxygen pressures of 3 × 10–3–0.3 Pa and at substrate temperatures of 25–200 °C. The influence of the oxygen pressure on the structure of the films was studied using transmission electron microscopy and electron diffraction. Below an oxygen pressure of 2 × 10–2 Pa, films were deposited in an In phase at room temperature, and in a In–In2O3 phase mixture at 100 °C and above. Above 2 × 10–2 Pa, films were amorphous or quasi-amorphous below 150 °C, while they were crystalline In2O3 at 150 and 200 °C. The lattice parameters of the In and In2O3 phases in the films were also determined by X-ray diffraction.