Application of Ru-based gate materials for CMOS technology
Authors:
- M. T˘aPajnaMTM. T˘aPajna
- P. Písec˘nYPPP. Písec˘nY
- R. LuptákRLR. Lupták
- K. Hus˘eKováKHK. Hus˘eKová
- K. FröhlichKFK. Fröhlich
- L. HarmathaLHL. Harmatha
- J.C. HookerJHJ.C. Hooker
- F. RoozeboomFRF. Roozeboom
- J. JergelJJJ. Jergel
- 1 January 2004
- journal article
- Published by Elsevier in Materials Science in Semiconductor Processing
- Vol. 7 (4-6) , 271-276
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
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