Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition
Authors:
- Lin-Ao ZhangLZLin-Ao Zhang
- Hao-Nan LiuHLHao-Nan Liu
- Xiao-Xia SuoXSXiao-Xia Suo
- Shuo TongSTShuo Tong
- Ying-Lan LiYLYing-Lan Li
- Zhao-Tan JiangZJZhao-Tan Jiang
- Zhi WangZWZhi Wang
- 1 December 2016
- journal article
- Published by Elsevier in Materials Letters
- Vol. 185, 295-298
Abstract
No abstract availableFunding Information
- National Natural Science Foundation of China (51002010, 11274040)
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