A MOSFET electron mobility model of wide temperature range (77 - 400 K) for IC simulation
Authors:
- 1 April 1997
- journal article
- Published by IOP Publishing in Semiconductor Science and Technology
- Vol. 12 (4) , 355-358
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- MOSFET carrier mobility model based on gate oxide thickness, threshold and gate voltagesSolid-State Electronics, 1996
- An accurate semi-empirical saturation drain current model for LDD n-MOSFETIEEE Electron Device Letters, 1996
- Physical understanding of low-field carrier mobility in silicon MOSFET inversion layerIEEE Transactions on Electron Devices, 1991
- MOSFET electron inversion layer mobilities - a physically based semi-empirical model for a wide temperature rangeIEEE Transactions on Electron Devices, 1989
- Semi-empirical equations for electron velocity in silicon: Part II—MOS inversion layerIEEE Transactions on Electron Devices, 1983