Quality of diamond wafers grown by microwave plasma CVD: effects of gas flow rate
Authors:
- V RalchenkoVRV Ralchenko
- I SychovISI Sychov
- I VlasovIVI Vlasov
- A VlasovAVA Vlasov
- V KonovVKV Konov
- A KhomichAKA Khomich
- S VoroninaSVS Voronina
- 1 March 1999
- journal article
- Published by Elsevier in Diamond and Related Materials
- Vol. 8 (2-5) , 189-193
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
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