The morphology and orientation of CrN films deposited by reactive ion plating
Authors:
- Dongdong WangDWDongdong Wang
- Takeo OkiTOTakeo Oki
- 1 March 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 185 (2) , 219-230
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Material selection for hard coatingsJournal of Vacuum Science & Technology A, 1986
- Properties of Cr–N films produced by reactive sputteringJournal of Vacuum Science & Technology A, 1986
- Chromium nitride films synthesized by radio-frequency reactive ion platingJournal of Vacuum Science & Technology A, 1986
- Hard chrome coatings deposited by physical vapour depositionThin Solid Films, 1983
- Physical vapor deposition of chromium and titanium nitrides by the hollow cathode discharge processThin Solid Films, 1978
- Characterization of thick chromium-carbon and chromium-nitrogen films deposited by hollow cathode dischargeThin Solid Films, 1977
- High Rate Thick Film GrowthAnnual Review of Materials Science, 1977